The platform offers different forms of support to the users, both in terms of the access procedures and terms, as well as on mask design.

The user needs to design the mask and submit it to the platform as a digital physical mask file (GDSII format). The platform offers the user support in a number of ways:

• The platform will check the user's mask for design rule compliance.

  An automated check is run on the mask in terms of design rule compliance, using regular design rule checking (DRC) software. A few iterations between the user and the platform are often needed to get a flawless mask. Basically, any features below the mask resolution (180nm or 130nm) should be avoided. This also means any sharp angles between structures should be avoided.

• The platform checks the user's mask manually for logical mask design errors such as disconnected waveguides.

  As there is no schematic extraction and LVS (layout versus schematic) software yet for such circuits, this is a manual step. Note that this check is only superficial and is no guarantee that all errors will be catched.

• The platform checks the user's mask for manufacturability.

  The platform will contact the user if there are features that will not be fabricated or are on the edge. The platform will also give some guidelines on how to bias structures on the mask for manufacturability. This support serves to give the users a better chance on a first-time right design. Note that the platform does not offer guarantees in terms of processing or manufacturability. Therefore, this support can in no circumstances be interpreted as a given guarantee by the user.

The coordinator gives support on how to use the service, about the financial and legal issues, and about any other practical question in how to use the platform.