ePIXfab MPW training course contents
Day 1: general information
The first day is oriented to a wider public of people interested to know the ins and outs of the MPW scheme, from research managers to the PhD students and designers.
- ePIXfab: goals, tasks, operation
- Technology overview
- Operation: scheme, terms of use, IP, pricing and finance, ...
- Supply chain: design software, design, manufacturing, post-processing, packaging, test
- Fab tour
Day 2: mask design for ePIXfab technologies
The second and third day are oriented to those who will actually make designs for ePIXfab or are interested to do so. These days will cover all details of designing for ePIXfab. It is not a hands-on course, but we prefer to go in detail on all aspects, in order to shorten your learning curve and shorten the total design cycle. This first course is focused on mask design and on technology.
- Technology: processes and their limitations:
- Masks and lithography
- Passive processes
- Active processes
- SiGe
- ePIXfab operation flow:
- design size allocation
- process flow description, process modules
- documents required to submit
- Masks and design rules: mask technologies, dark-field/light-field, critical dimensions
- Design rules:
- Design rules document
- Layers and process steps
- Minimum and advised feature sizes
- Design rule checking
- Software:
- simulation, mask design, design rule checking
- process design kit
- Template masks
- Components:
- Fiber I/O
- Splitters, crossings
- Basic wavelength filters
- Basic active devices
- Basic SiGe devices
- Guidelines and examples:
- Grid snapping
- Narrow tips and trenches
- Round and oblique objects
- Text
- Dark-field/light-field inversion
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